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Fabrication and characterization of low defect density GaN using facet-controlled epitaxial lateral overgrowth (FACELO)

Journal of Crystal Growth · 2000 · Vol. 221(1-4) · pp. 316–326
Kazumasa HiramatsuK. NishiyamaMasaru OnishiH. MizutaniMitsuhisa NarukawaAtsushi MotogaitoHideto MiyakeYasushi IyechikaTakayoshi Maeda
GaN-based semiconductor devices and materialsMetal and Thin Film MechanicsSemiconductor materials and devicesEpitaxyFacet (psychology)Coalescence (physics)Metalorganic vapour phase epitaxyDislocationMaterials scienceOptoelectronicsFabricationThreading (protein sequence)Optics

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  • Japan Society for the Promotion of Science
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