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Scaling of GaN HEMTs and Schottky Diodes for Submillimeter-Wave MMIC Applications

IEEE Transactions on Electron Devices · 2013 · Vol. 60(10) · pp. 2982–2996
K. ShinoharaD. ReganYan TangA. CorrionDavid F. BrownJoel WongJohn F. RobinsonHelen FungAdele SchmitzThomas C. OhSamuel Jungjin KimPeter S. ChenRobert G. NageleA. MargomenosM. Micovic

Abstract

In this paper, we report state-of-the-art high frequency performance of GaN-based high electron mobility transistors (HEMTs) and Schottky diodes achieved through innovative device scaling technologies such as vertically scaled enhancement and depletion mode (E/D mode) AlN/GaN/AlGaN double-heterojunction HEMT epitaxial structures, a low-resistance <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex Notation="TeX">$n^{+}$</tex></formula> -GaN/2DEG ohmic contact regrown by MBE, a manufacturable 20-nm symmetric and asymmetric self-aligned-gate process, and a lateral metal/2DEG Schottky contact. As a result of proportional scaling of intrinsic and parasitic delays, an ultrahigh <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$f_{T}$</tex></formula> exceeding 450 GHz (with a simultaneous <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$f_{\rm max}$</tex></formula> of 440 GHz) and a <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$f_{\rm max}$</tex></formula> close to 600 GHz (with a simultaneous <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$f_{T}$</tex></formula> of 310 GHz) are obtained in deeply scaled GaN HEMTs while maintaining superior Johnson figure of merit. Because of their extremely low on-resistance and high gain at low drain voltages, the devices exhibited excellent noise performance at low power. 501-stage direct-coupled field-effect transistor logic ring oscillator circuits are successfully fabricated with high yield and high uniformity, demonstrating the feasibility of GaN-based E/D-mode integrated circuits with <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">${&gt;}{1000}$</tex> </formula> transistors. Furthermore, self-aligned GaN Schottky diodes with a lateral metal/2DEG Schottky contact and a 2DEG/ <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$n^{+}$</tex></formula> -GaN ohmic contact exhibited <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$RC$</tex></formula> -limited cutoff frequencies of up to 2.0 THz.

GaN-based semiconductor devices and materialsRadio Frequency Integrated Circuit DesignGa2O3 and related materialsHigh-electron-mobility transistorSchottky diodeOptoelectronicsScalingDiodePhysicsMaterials scienceTopology (electrical circuits)TransistorElectrical engineering
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