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On approach to increase integration rate of elements of an element AND-NOT with three inputs

E.L. Pankratov

Abstract

In this paper we introduce an approach to increase integration rate of elements of an element AND-NOT with three inputs. In the framework the approach we consider a heterostructure with special configuration. Several specific areas of the heterostructure should be doped by diffusion or ion implantation. Annealing of dopant and/or radiation defects should be optimized.

Additive Manufacturing and 3D Printing TechnologiesDopantHeterojunctionAnnealing (glass)Ion implantationDopingMaterials scienceDiffusionComputer scienceIonOptoelectronics
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